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Altje Latununuwe
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Preliminary Study on Nickel Nanoparticle growth by Sputtering Method Patricia Lubis; Altje Latununuwe; Toto Winata
Jurnal Dosen Universitas PGRI Palembang PROSIDING DOSEN UNIVERSITAS PGRI PALEMBANG EDISI 14
Publisher : Jurnal Dosen Universitas PGRI Palembang

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AbstractNickel nanopartickel has been grown on Si (100) substrate by the sputtering method. The growth parameters were 4 x 10-1 Torr pressure, 1500C temperature, 77,3 sccm Argon gas flow and 90, 30,10, 5, 1 minutes deposition time. The as deposited nickel nanoparticles were annealed for 30 minutes and 4 hours. The Nickel nanoparticles were then characterized using Scanning Electron Microscopy (SEM) and Energy Dispersive Analysis X-Ray (EDAX). The smallest size of Nickel nanoparticles found is about 50 nm.Keywords: nanoparticle, sputtering, anneal.
Characterization Ni Nanocatalyst on Si (100) Substrate By Sputtering Growth Methods Patricia Lubis; Altje Latununuwe; Toto Winata
Jurnal Dosen Universitas PGRI Palembang PROSIDING DOSEN UNIVERSITAS PGRI PALEMBANG EDISI 14
Publisher : Jurnal Dosen Universitas PGRI Palembang

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Abstract

AbstractCharacterization Ni metal nanocatalyst had been analyzed on Si (100) substrate with Sputtering Growth Methods. The sputtering conditions used were 4x10-1 torr in pressure; 1500C in temperature; 77.3 sccm in Ar gas flow; and 90,30,20 minutes in time depositions. After growth deposition, metal nanocatalysts were annealed in temperature 6000C for 30 minutes. Characterizations of Ni metal nanocatalysts were used Scanning Electron Microscopy (SEM) and Energy Dispersive Analysis X-Ray (EDAX) and we found the tendency of smallest structure with decrease of time deposition.Keywords: nanocatalyst, sputtering, anneal.
Co-Authors Patricia Lubis, Patricia Toto Winata