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Pemisahan Lignin Dari Kapuk (Ceiba Pentandra) Untuk Memperoleh Selulosa Kadar Tinggi Harita N Chamidy
Prosiding Industrial Research Workshop and National Seminar Vol 12 (2021): Prosiding 12th Industrial Research Workshop and National Seminar (IRWNS)
Publisher : Politeknik Negeri Bandung

Show Abstract | Download Original | Original Source | Check in Google Scholar | Full PDF (491.402 KB)

Abstract

Pemisahan Lignin Dari Kapuk (Ceiba Pentandra) Untuk Memperoleh Selulosa Kadar Tinggi
EFFECT OF VOLTAGE ON THE THICKNESS OF OXIDE LAYER AT ALUMINUM ALLOYS FOR STRUCTURAL BONDING USING PHOSPHORIC SULFURIC ACID ANODIZING (PSA) PROCESS Harita N Chamidy; Agustinus Ngatin; Anisa Fitriani Rosyadi; Arisya Julviana; Noviyani Noviyani
International Journal of Mechanical Engineering Technologies and Applications Vol. 4 No. 1 (2023)
Publisher : Mechanical Engineering Department, Engineering Faculty, Brawijaya University

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.21776/MECHTA.2023.004.01.8

Abstract

The aerospace industry mostly uses the aluminum alloys 2xxx and 7xxx series for their fuselage construction, and some of them are assembled using structural bonding because it is strong, easy during the fabrication process, resistant to corrosion, and non-toxic. The anodization process is a proven surface treatment method for structural bonding. Phosphoric Sulfuric Acid Anodizing (PSA) is an eco-friendly alternative as a chromate-free solvent technology for the anodizing process that is applied for structural bonding. The thickness of the oxide layer caused by the voltage given in this process was evaluated in terms of corrosion resistance using the oxide layer's thickness as the main factor. The PSA process of AA2024 T3 clad was carried out at a constant concentration of 125 g/L of phosphoric acid, 80 g/L of sulfuric acid, 27 A, and a temperature of 26 to 28 OC for 23 minutes with various voltages. The voltage was varied at 16, 18, and 20 VDC. The optimum condition for the voltage applied was 18 VDC, which resulted in an oxide layer thickness of 2.76 µm.