BERKALA FISIKA
Vol 13, No 1 (2010): Berkala Fisika

Studi Sifat Termal Prekursor In(TMHD)3 Untuk Menumbuhkan Lapisan Tipis In2O3 dengan Teknik MOCVD

Saragih, Horasdia (Unknown)
Hasniah, Hasniah (Unknown)
Sustini, Euis (Unknown)
Sukirno, Sukirno (Unknown)



Article Info

Publish Date
19 Mar 2012

Abstract

The In2O3 thin films have been deposited on quartz substrate by MOCVD technique using In(TMHD)3 as a metal organic precurcor. Thermal properties of In(TMHD)3 material have been investigated by analyses of TG-DTA curve and FTIR spectrum to determine the value of In2O3 deposition parameters. Based on TG-DTA curve and FTIR spectrum analyses, we find that: (1) melting point of In(TMHD)3 powder is 175oC; (2) In(TMHD)3 powder starts to evaporate at 184oC; (3) partial oxidation of In(TMHD)3 in Ar/atmosfer accur at 260oC; and (4) dissosiation of TMHD ligand from indium metal element happened in the temperature range 300oC – 400oC. According to these results, we maintaned growth condition for deposition of In2O3: the temperature of In(TMHD)3 bubbler (Tb) = 200oC; the pressure of In(TMHD)3 bubbler (Pb) = 260 Torr; the rate of argon gas flow to carried out the vapor of In(TMHD)3 = 50 sccm; the rate of oxygen gas = 50 sccm; and temperature of substrate = 300oC. In 120 minutes, the thickness of deposited In2O3 thin films, the rate of deposition, and the roughness of film surface are about 0.2 µm, 1.6x10-3 µm/menit and 70 nm, respectively.   Keywords: In(TMHD)3 precursor, In­2O3, thin films, thermal properties, MOCVD.

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Journal Info

Abbrev

berkala_fisika

Publisher

Subject

Physics

Description

BERKALA FISIKA adalah jurnal saintifik yang diterbitkan secara periodik 3 bulanan. Jurnal ini memuat kajian-kajian Fisika baik kajian teoretik maupun hasil eksperimen. Jurnal ini juga memberi ruang yang luas bagi kajian – kajian aplikasi fisika dalam bidang teknologi, ilmu-ilmu hayati dan ...