Indonesian Journal of Electrical Engineering and Informatics (IJEEI)
Vol 5, No 2: June 2017

Birefringence Control in Silicon Wire Waveguide by Using Over-etch

Ika Puspita (Institut Teknologi Sepuluh Nopember)
Agus Muhamad Hatta (Institut Teknologi Sepuluh Nopember)



Article Info

Publish Date
01 Jun 2017

Abstract

Silicon wire waveguide technology becomes great issue in optical communication system. The high index contrast of the silicon wire waveguide induced the birefringence. It played important role in silicon wire waveguide loss since it caused polarization dependent loss (PDL), polarization mode dispersion (PMD) and wavelength shifting. Hence, suitable controlling birefringence in silicon wire waveguide becomes very important. The current birefringence controlling techniques by using cladding stress and geometrical variation in bulk silicon waveguide was presented. Unfortunately, it could not obtain zero birefringence when applied to silicon wire waveguide. The over-etching technique was employed in this paper to obtain zero birefringence. The tall silicon wire waveguide obtained minimum birefringence.

Copyrights © 2017






Journal Info

Abbrev

IJEEI

Publisher

Subject

Computer Science & IT Electrical & Electronics Engineering

Description

Indonesian Journal of Electrical Engineering and Informatics (IJEEI) is a peer reviewed International Journal in English published four issues per year (March, June, September and December). The aim of Indonesian Journal of Electrical Engineering and Informatics (IJEEI) is to publish high-quality ...